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MKS Announces Enhanced Etch Sensor for Baratron® Capacitance Manometer Product LineDelivers improved etch process control for next-generation process nodes ANDOVER, Mass., July 10, 2018 (GLOBE NEWSWIRE) -- MKS Instruments, Inc. (NASDAQ:MKSI), a global provider of technologies that enable advanced processes and improve productivity, today announced the release of its revolutionary Enhanced Etch Sensor for the Baratron® E28 and DA02 capacitance manometer product line. The Enhanced Etch Sensor delivers low-pressure control for next-generation process nodes by providing a 5x decrease in drift associated with fluorine used in etch, including atomic layer etch applications. “Innovation that enables our customers to do more is at the heart of what MKS delivers, and the market leading Enhanced Etch Sensor is evidence of our commitment,” said Tim Haynes, Vice President and General Manager of Pressure Products. Fluorine gas is a corrosive gas commonly used in semiconductor etch processes. At the lower operating pressures associated with next-generation process nodes, fluorine causes a dift that impacts capability and productivity. “Modeling of the sensor based on our knowledge of the etch process was a key factor in the optimization of our sensor development,” said Phillip Sullivan, CTO of Pressure Products. The Enhanced Etch Sensor continues a rich history of innovation in the Baratron® capacitance manometer product line. Find out more about our product here. About MKS Instruments For More Information, contact: |