|[February 16, 2014]
Gigaphoton Achieves 43W EUV Output
OYAMA, Japan --(Business Wire)--
Gigaphoton Inc., a major lithography light source manufacturer,
announced today that it has achieved 43W output at 100kHz from its
second prototype laser-produced plasma (LPP) light source for EUV
lithography scanners. The 43W output was achieved at 2.4 percent
conversion efficiency (CE). This result represents another critical
milestone in achieving production-level laser system performance.
Gigaphoton aims to achieve 150W output on its prototype system by the
end of 2014, and 250W output on a full EUV high-volume manufacturing
(HVM) system by 2015.
Gigaphoton has been pursuing its own unique development of LLP light
sources. The milestone was confirmed using a prototype LPP system, which
generates EUV light by irradiating tin (Sn) droplets with a solid-state,
pre-pulse laser and a CO2 main pulse laser. The tin debris
generated from the irradiation is mitigated through the combination of a
high-power, superconducting magnet and Sn etching using H2
Gigaphoton has focused on developing unique technologies that enable
high-output, stable, and economical (cost-effective) LPP light sources
since 2002. As a result, it has introduced multiple unique technologies,
including <20um droplet-on-demand technology, the optimized combination
of short-wavelngth, solid-state laser pre-pulse and CO2
laser main pulse to irradiate an Sn droplet, and magnetic debris
mitigation. The recent achievement exemplifies Gigaphoton's highly
advanced technical capabilities, which continue to bring the company
closer to mass production of LPP light sources.
Gigaphoton's LPP light source technology extends the lifetime of the
droplet generator by utilizing ultra-small tin droplets that are ejected
on demand, resulting in longer life for parts and, ultimately, reduced
downtime and cost. In addition, high EUV output CE is achieved through
the optimized combination of short-wavelength, solid-state pre-pulse
laser and CO2 laser as the main pulse. This technology
contributes to the real possibility of achieving efficient, high-output
EUV light sources. In order to maximize the life of the collector
mirror, a superconducting magnet generates a powerful magnetic field
that guides the unwanted debris resulting from the thermal expansion of
the tin droplets towards the tin catcher. This results in the further
reduction of cost and downtime.
"I am very excited about the huge progress we have made in realizing our
vision of delivering a highly efficient, high-output, low-cost, stable
LPP light source," said Hitoshi Tomaru, President and CEO of Gigaphoton.
"We will accelerate the development of our LPP light source to meet the
industry's intense demand for HVM-level EUV lithography tools."
Since its founding in 2000, Gigaphoton has developed and delivered
user-friendly, high-performance DUV laser light sources used by major
semiconductor chipmakers in the Pan-Asian, US and European regions.
Gigaphoton's patented, innovative LPP EUV technology solutions lead the
way to cost-effective, highly productive lithography sources for
high-volume production. With a global business outlook, Gigaphoton
strives to be the world's number-one lithography light source provider,
focusing on end-user needs in every phase of its business, from research
and development to manufacturing, to best-in-class reliability and
world-class customer support. For more information please visit http://www.gigaphoton.com/?lang=en
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