[May 04, 2013] Rohm and Haas Electronic Materials Assigned Patent Tweet (Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service ALEXANDRIA, Va., May 4 -- Rohm and Haas Electronic Materials, Marlborough, Mass., has been assigned a patent (8,431,329) developed by Young Cheol Bae, Weston, Mass., Thomas Cardolaccia, Needham, Mass., and Yi Liu, Wayland, Mass., for "self-aligned spacer multiple patterning methods." The abstract of the patent published by the U.S. Patent and Trademark Office states: "Self-aligned spacer multiple patterning method are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture." The patent application was filed on June 28, 2010 (12/825,117). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,431,329&OS=8,431,329&RS=8,431,329 Written by Satyaban Rath; edited by Hemanta Panigrahi. SR0504HP0504-873782 (c) 2013 Targeted News Service [ Back To TMCnet.com's Homepage ]