Applied Materials Introduces Advanced CVD Films to Enable Metal Oxide-Based High Resolution Displays
(Thomson Reuters ONE (English) Via Acquire Media NewsEdge)
* Screens in tablets and TVs moving to metal oxide technology for higher
* New AKT-PECVD films provide a cost-effective path for bringing metal oxide
backplanes rapidly to market
SHANGHAI, China, March 20, 2012 - Applied Materials, Inc. today announced new
PECVD film technology to produce higher-performance, high-resolution displays
for next-generation tablet computers and TVs. Available on Applied's industry-
leading AKT-PECVD system, these advanced insulating films enable the use of
metal oxide-based transistors that produce smaller, faster-switching pixels to
create higher resolution screens preferred by consumers.
Applied's new PECVD films provide a dielectric-layer interface for metal oxide
transistors that minimizes hydrogen impurities to improve transistor stability
and deliver optimized screen performance. These high-quality silicon oxide
(SiO2) films can be deposited by the AKT-PECVD system with precise uniformity on
sheets of glass up to 9m2 in size - a capability that is critical to achieving
high production yields and low manufacturing costs.
"Display makers are aggressively investing in metal oxide transistor capability,
and our advanced PECVD films overcome the uniformity and stability challenges of
these complex dielectric films, clearing a major hurdle to implementing this
important new technology," said Tom Edman, group vice president and general
manager of Applied's AKT Display Business Group. "By extending the capabilities
of our world-class AKT-PECVD system to dielectric film deposition for metal
oxide, Applied has provided a rapid, cost-effective path to help bring this
technology to market. Customers have had excellent results with these new films
on our system and we are seeing strong demand from major display manufacturers
for upgrades and new systems."
In addition to its new PECVD films, Applied is currently developing advanced PVD
solutions, including IGZO deposition, for metal oxide manufacturing. Using its
latest rotary cathode array technology, Applied is demonstrating highly-uniform,
homogeneous and low-defect, active-layer deposition at higher productivity rates
and lower material consumption costs than currently available PVD solutions.
Applied Materials will showcase its solutions for metal oxide, thin film
transistor liquid crystal display manufacturing at FPD China 2012 from March
20-22 in Shanghai. To learn more about Applied's activities at the show, visit
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in providing
innovative equipment, services and software to enable the manufacture of
advanced semiconductor, flat panel display and solar photovoltaic products. Our
technologies help make innovations like smartphones, flat screen TVs and solar
panels more affordable and accessible to consumers and businesses around the
world. At Applied Materials, we turn today's innovations into the industries of
tomorrow. Learn more at www.appliedmaterials.com.
# # #
Connie Duncan (editorial/media) 408.563.6209
Michael Sullivan (financial community) 408.986.7977
Photo Caption: Applied Materials' world-class AKT-PECVD systems deposit the
critical dielectric films that are enabling the transition to metal oxide-based
high resolution displays.
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Source: Applied Materials via Thomson Reuters ONE
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