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Varian Semiconductor Equipment Associates Assigned Patent
[April 27, 2012]

Varian Semiconductor Equipment Associates Assigned Patent

(Targeted News Service Via Acquire Media NewsEdge) By Targeted News Service ALEXANDRIA, Va., April 27 -- Varian Semiconductor Equipment Associates, Gloucester, Mass., has been assigned a patent (8,164,068) developed by four co-inventors for a "mask health monitor using a faraday probe." The co-inventors are Benjamin B. Riordon, Newburyport, Mass., Nicholas P.T. Bateman, Reading, Mass., William T. Weaver, Austin, Texas, and Russell J. Low, Rowley, Mass.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The current of the ion beam directed through a plurality of apertures of the mask is measured using the ion current measurement device. In this manner, the position of the mask with respect to the ion beam as well as the condition of the mask may be determined based on the ion current profile measured by the ion current measurement device." The patent application was filed on July 28, 2010 (12/845,665). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=81,64,068&OS=81,64,068&RS=81,64,068 Written by Kusum Sangma; edited by Anand Kumar.

KS0427AK0427-730874 (c) 2012 Targeted News Service

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